Influence of atomic layer deposition chemistry on high-k dielectrics for charge trapping memories-Reference-Cited by-同舟云学术

Influence of atomic layer deposition chemistry on high-k dielectrics for charge trapping memories

Published:2012-02 Issue: Volume:68 Page:38-47
ISSN:0038-1101
Container-title:Solid-State Electronics
language:en
Short-container-title:Solid-State Electronics

Author:

Nikolaou Nikolaos,Dimitrakis Panagiotis,Normand Pascal,Ioannou-Sougleridis Vassilios,Giannakopoulos Konstantinos,Mergia Konstantina,Kukli Kaupo,Niinistö Jaakko,Ritala Mikko,Leskelä Markku

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference36 articles.

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