Design of Convex Corner Compensation Pattern in Manufacturing of Si Diaphragms-Reference-Cited by-同舟云学术

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Design of Convex Corner Compensation Pattern in Manufacturing of Si Diaphragms

Published:2022 Issue: Volume:4 Page:1-9
ISSN:2589-2088
Container-title:Solid State Electronics Letters
language:en
Short-container-title:Solid State Electronics Letters

Author:

Yu Nam Chol^ORCID,Jon Chung-Hyok,Chu KyongIl,Ryang KumJun

Publisher

Elsevier BV

Reference31 articles.

1. Micro-fabrication of crystalline silicon by controlled alkali etching;Fulong;Journal of Materials Processing Technology,2004

2. Anisotropic etching in low-concentration KOH: effects of surfactant concentration;Pal;Micro & Nano Letters,2015

3. Investigations on the correlation between surface texturing histogram and the spectral reflectance of (100) Crystalline Silicon Substrate textured using anisotropic etching;Akila;Sensors and Actuators A,2017

4. Rao, et al. Etching characteristics of Si{110} in 20 wt% KOH with addition of hydroxylamine for the fabrication of bulk micromachined MEMS Micro and Nano Syst Lett., 2017, Vol. 5, pp. 23, doi:10.1186/s40486-017-0057-7.

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