Density functional study on the adsorption and surface reactions on SiO2 in TiN-CVD using TiCl4 and NH3-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Density functional study on the adsorption and surface reactions on SiO2 in TiN-CVD using TiCl4 and NH3

Published:2002-04 Issue:1 Volume:409 Page:51-57
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Tanaka Tatsuo,Nakajima Tohru,Yamashita Koichi

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference30 articles.

1. The Chemistry of Metal CVD;Kodas,1994

2. LPCVD TiN as Barrier Layer in VLSI

3. In situ investigation of TiN formation on top of TiSi2

4. N. Yokoyama, K. Hinode, Y. Homma, Abstract 466. The Electrochemical Society Extended Abstracts, vol. 89-2, Meeting of the Society, Hollywood, FL, USA, October 15–20, 1989, p. 679.

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advanced ceramics in energy storage applications: Batteries to hydrogen energy;Journal of Energy Storage;2024-09

2. Atomistic kinetic Monte Carlo simulation on atomic layer deposition of TiN thin film;Computational Materials Science;2022-10

3. Chemical bonding analysis in Ti1––Al Ta N solid solutions;Surface and Coatings Technology;2020-08

4. Application of Ellipsometry to Control the Plasmachemical Synthesis of Thin TiONx Layers;Advances in Condensed Matter Physics;2015

5. ALD Simulations;Atomic Layer Deposition for Semiconductors;2013-10-19

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP