Deposition behavior of hexamethydisiloxane films based on the FTIR analysis of Si–O–Si and Si–CH3 bonds
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference18 articles.
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3. Polymerization of methane
4. A. Wrobel, M.R. Wertheimer, Plasma Deposition Treatment, and Etching of Polymers, Academic Press, 1990, pp. 163–268.
5. Hybrid Films Formed from Hexamethyldisiloxane and SiO by Plasma Process
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