Optical characterization of low optical thickness thin films from transmittance and back reflectance measurements-Reference-Cited by-同舟云学术

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Optical characterization of low optical thickness thin films from transmittance and back reflectance measurements

Published:2000-09 Issue:1-2 Volume:372 Page:149-155
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Laaziz Y.,Bennouna A.,Chahboun N.,Outzourhit A.,Ameziane E.L.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. The influence of thickness and index inhomogeneities on the transmission of semiconductor thin films

2. The effect of annealing on the optical and electrical properties of a-Si:H sputtered films

3. On some important care to take when making spectrophotometric measurements on semiconductor thin films

4. A method for monitoring the thickness of semiconductor and dielectric thin films: application to the determination of large-area thickness profiles

5. Determination of surface roughness and optical constants of inhomogeneous amorphous silicon films

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5. Empirical expressions for the spectral dependence of the refractive index for the case of thin-film silicon and some of its common alloys;Journal of Materials Science: Materials in Electronics;2018-12-03

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