Influence of Si(100) surface pretreatment on the morphology of TiO2 films grown by atomic layer deposition-Reference-Cited by-同舟云学术

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Influence of Si(100) surface pretreatment on the morphology of TiO2 films grown by atomic layer deposition

Published:2003-09 Issue:1-2 Volume:440 Page:109-116
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Finnie K.S.,Triani G.,Short K.T.,Mitchell D.R.G.,Attard D.J.,Bartlett J.R.,Barbé C.J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference21 articles.

1. Surface chemistry of materials deposition at atomic layer level

2. Atomic Layer Chemical Vapor Deposition of TiO[sub 2] Low Temperature Epitaxy of Rutile and Anatase

3. Structure and stability of ultrathin zirconium oxide layers on Si(001)

4. Glow Discharge Processes, Sputtering and Plasma Etching;Chapman,1980

5. An isotope approach to characterization of microwave water plasma modified polyimide surfaces

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2. Interface Engineering of TiO2 Photoelectrode Coatings Grown by Atomic Layer Deposition on Silicon;ACS Omega;2021-10-07

3. Mechanical and optical properties of as-grown and thermally annealed titanium dioxide from titanium tetrachloride and water by atomic layer deposition;Thin Solid Films;2021-08

4. Impact of Different Intermediate Layers on the Morphology and Crystallinity of TiO 2 Grown on Carbon Nanotubes by Atomic Layer Deposition;Advanced Materials Interfaces;2021-07-11

5. Effect of thermally annealed atomic-layer-deposited AlOx/chemical tunnel oxide stack layer at the PEDOT:PSS/n-type Si interface to improve its junction quality;Journal of Applied Physics;2020-07-28

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