Strained SiGe/Si quantum well dots and wires selectively grown by LPCVD and their optical properties
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference24 articles.
1. C. Weisbuch and B. Vinter, Quantum Semiconductor Structures, Academic Press, Boston, 1991.
2. K. Eberl, P.M. Petroff and P. Demeester, (eds.), Low Dimensional Structures Prepared by Epitaxial Growth and Regrowth on Patterned Substrates, NATO ASI Series, 298 (1995).
3. D.J. Eaglesham and M. Cerullo, Phys. Rev. Lett., 64 (1990) 1943.
4. R. Apetz, L. Vescan, A. Hartmann, C. Dieker and H. Lüth, Appl. Phys. Lett., 66 (1995) 445.
5. P. Schittenhelm, M. Gail, J. Brunner, J.F. Nützel and G. Abstreiter, Appl. Phys. Lett., 67 (1995) 1292.
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