Fundamental considerations regarding the growth of amorphous and microcrystalline silicon and alloy films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. B.P. Nelson, Thin Solid Films, in press.
2. Remote Silane Plasma Chemistry Effects and their Correlation with a-Si:H Film Properties
3. Effect of microvoids on initial and light‐degraded efficiencies of hydrogenated amorphous silicon alloy solar cells
4. Analysis of Plasma Properties and Deposition of Amorphous Silicon Alloy Solar Cells Using Very High Frequency Glow Discharge
5. High Quality a-Si:H Films Grown at High Deposition Rates
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1. Film structure and optical characteristics of a-Si:H prepared with a rotary table type layer-by-layer sputtering method for application in short-wave near-infrared filters;Optical Materials Express;2022-10-04
2. The growth mechanism of Ge1−x-Cx:H films deposited by PECVD method;Diamond and Related Materials;2020-03
3. Conformal coating of amorphous silicon and germanium by high pressure chemical vapor deposition for photovoltaic fabrics;APL Materials;2018-04
4. High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells;Advanced Materials;2016-05-13
5. Control of crystalline volume and nano crystal grain size in nanocrystalline silicon thin film deposited by PECVD;The European Physical Journal Applied Physics;2014-11
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