High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells-Reference-Cited by-同舟云学术

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High Pressure Chemical Vapor Deposition of Hydrogenated Amorphous Silicon Films and Solar Cells

Published:2016-05-13 Issue:28 Volume:28 Page:5939-5942
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

He Rongrui¹,Day Todd D.¹,Sparks Justin R.¹,Sullivan Nichole F.¹,Badding John V.¹²

Affiliation:

1. Department of Chemistry and Materials Research Institute Pennsylvania State University University Park PA 16802 USA

2. Department of Physics Department of Materials Science and Engineering Pennsylvania State University University Park PA 16802 USA

Funder

National Science Foundation

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adma.201600415

Reference38 articles.

1. Nanostructured materials for advanced energy conversion and storage devices

2. Reactive Ballistic Deposition of Nanostructured Model Materials for Electrochemical Energy Conversion and Storage

3. Active nanoplasmonic metamaterials

4. Three-Dimensional Battery Architectures

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1. Chemical structure characteristics of flexible low-k SiCOH thin films etched by inductively coupled plasma-reactive ion etching process using FTIR and XPS spectra analysis;Microelectronic Engineering;2024-09

2. Crystallization of Hydrogenated Amorphous Silicon Thin Films Using Combined Continuous Wave Laser and Thermal Annealing;Silicon;2024-05-11

3. Improved interface microstructure between crystalline silicon and nanocrystalline silicon oxide window layer of silicon heterojunction solar cells;Solar Energy Materials and Solar Cells;2024-01

4. Optimized Substrate Orientations for Highly Uniform Metal Halide Perovskite Film Deposition;ACS Applied Materials & Interfaces;2023-09-06

5. Crystallization of Hydrogenated Amorphous Silicon Thin Films Using Combined Continuous Wave Laser and Thermal Annealing;2023-01-30

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