Depth profiling and the effect of oxygen and carbon on the photoelectrical properties of amorphous silicon films deposited using tungsten wire filaments-Reference-Cited by-同舟云学术

Depth profiling and the effect of oxygen and carbon on the photoelectrical properties of amorphous silicon films deposited using tungsten wire filaments

Published:2001-09 Issue:1-2 Volume:395 Page:130-133
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Persheyev S.K,Goldie D.M,Gibson R.A.G,Rose M.J,Anthony S,Keeble D.J,Robb K,Main C,Reynolds S,Zrinscak I

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference4 articles.

1. An experimental evaluation of transient and modulated photocurrent density-of-states spectroscopies

2. Direct measurement of the deep defect density in thin amorphous silicon films with the ‘‘absolute’’ constant photocurrent method

3. Formation of nano-crystalline Si by thermal annealing of SiOx, SiCx and SiOyCx amorphous alloys: model systems for advanced device processing

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. THz generation from a nanocrystalline silicon-based photoconductive device;Semiconductor Science and Technology;2011-04-11

2. Quantitative hydrogen measurements in PECVD and HWCVD a-Si:H using FTIR spectroscopy;Journal of Materials Science;2006-06-06

3. Optical and electronic properties of HWCVD and PECVD silicon films irradiated using excimer and Nd:Yag lasers;Thin Solid Films;2006-04

4. Atmospheric adsorption effects in hot-wire chemical-vapor-deposition microcrystalline silicon films with different electrode configurations;Semiconductors;2005-03

5. Excimer Laser Crystallized HWCVD Thin Silicon Films: Electron Field Emission;MRS Proceedings;2005