Application of CCl2F2- and CCl4-based plasmas for RIE of GaSb and related materials-Reference-Cited by-同舟云学术

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Application of CCl2F2- and CCl4-based plasmas for RIE of GaSb and related materials

Published:2000-01 Issue:1 Volume:56 Page:57-61
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Piotrowska A,Kamińska E,Piotrowski T.T,Guziewicz M,Golaszewska K,Papis E,Wróbel J,Perchuć L

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference20 articles.

1. High temperature operation of GaInAsSb/AlGaAsSb double‐heterostructure lasers emitting near 2.1 μm

2. GaInAsSb/GaSb pn photodiodes for detection to 2.4 μm

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