Role of the gas temperature and power to gas flow ratio on powder and voids formation in films grown by PECVD technique
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference12 articles.
1. Amorphous silicon based devices;Bruno,1995
2. Plasma processing of semiconductors, applied science, vol. 336;Kroesen,1997
3. Diagnostics of particle genesis and growth in RF silane plasmas by ion mass spectrometry and light scattering
4. Particle agglomeration study in rf silane plasmas:Insitustudy by polarization‐sensitive laser light scattering
5. Engineering of the energy coupling in PECVD systems used to produce large area a-Si:H coatings
Cited by 17 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of gas temperature on the structural and optoelectronic properties of a-Si:H thin films deposited by PECVD;Surface and Coatings Technology;2013-01
2. Hydrogen bonding in hydrogenated amorphous silicon thin films prepared at different precursor gas temperatures with undiluted silane;Science China Technological Sciences;2011-05-14
3. Nanostructured silicon and its application to solar cells, position sensors and thin film transistors;Philosophical Magazine;2009-10
4. Raman and ellipsometric characterization of hydrogenated amorphous silicon thin films;Science in China Series E: Technological Sciences;2008-10-23
5. Effects of gas temperature on optical and transport properties of a-Si:H films deposited by PECVD;Philosophical Magazine;2008-09
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3