Influence of substrate temperature and bias voltage on the optical transmittance of TiN films
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference18 articles.
1. Microstructure modification of TiN by ion bombardment during reactive sputter deposition
2. Effect of post‐deposition annealing on structure and chemistry of the TiN film/steel substrate interfaces
3. Room temperature oxidation behavior of TiN thin films
4. The effect of thermal treatment on the structure, optical and electrical properties of amorphous titanium nitride thin films
5. The effect of substrate temperature and biasing on the mechanical properties and structure of sputtered titanium nitride thin films
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1. Reducing the incorporation of contaminant oxygen in decorative TiN coatings deposited by low temperature reactive sputtering;Vacuum;2024-08
2. Effect of Substrate Bias Voltage on Infrared Characteristics of TiN Films;Journal of Electronic Materials;2022-10-11
3. Effect of short-pulsed ion irradiation on the optical and electrical properties of titanium nitride films deposited by reactive magnetron sputtering;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2022-09
4. Characteristics of TiN Thin Films Deposited by Substrate Temperature Variables Using Scanning Acoustic Microscopy;Applied Sciences;2022-03-31
5. Influence of the deposition temperature on the optical and electrical properties of TiN film by spectroscopic ellipsometry;Superlattices and Microstructures;2021-03
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