Effect of short-pulsed ion irradiation on the optical and electrical properties of titanium nitride films deposited by reactive magnetron sputtering-Reference-Cited by-同舟云学术

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Effect of short-pulsed ion irradiation on the optical and electrical properties of titanium nitride films deposited by reactive magnetron sputtering

Published:2022-09 Issue: Volume:526 Page:51-59
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Konusov F.,Pavlov S.,Lauk A.,Kabyshev A.,Novikov V.,Gadirov R.,Tarbokov V.,Remnev G.

Funder

Tomsk Polytechnic University

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference42 articles.

1. Structural and hydrophilic properties of TiN films prepared by ultrasonic atomization assisted spray method under low temperature

2. Effects of ion flux density and energy on the composition of TiNx thin films prepared by magnetron sputtering with an anode layer ion source

3. Structural and optical characterization of titanium nitride thin films deposited by magnetron sputtering

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electron Irradiation-Induced Degradation of TiN Thin Films on Quartz and Sapphire Substrates;ACS Omega;2023-12-22

2. A High‐Detectivity, Fast‐Response, and Radiation‐Resistant TiN/CdZnTe Heterojunction Photodiode;Advanced Optical Materials;2022-11-16

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