Low-temperature treatment of Si/SiO2 structures in an RF hydrogen plasma
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference26 articles.
1. High-Temperature Annealing of Oxidized Silicon Surfaces
2. Dependence of Interface State Density on Silicon Thermal Oxidation Process Variables
3. An investigation of the influence of low-temperature annealing treatments on the interface state density at the Si-SiO2
4. Experimental evidence for two fundamentally different E′ precursors in amorphous silicon dioxide
5. Passivation and depassivation of silicon dangling bonds at the Si/SiO2interface by atomic hydrogen
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