Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference30 articles.
1. Two-dimensional modeling of high plasma density inductively coupled sources for materials processing
2. Coupled model for neutral transport and charged species dynamics in high density plasma reactors
3. Hardmask charging during Cl2 plasma etching of silicon
4. Stout P, Kolobov V, Zhou N, Abdollahi-Alibeik S, McVittie J, Saraswatt K. 17th VMIC Conference Proceedings, Santa Clara, CA 2000. p. 243.
5. Kushner M, Lu J. 17th VMIC Conference Proceedings, Santa Clara, CA 2000. p. 211.
Cited by
11 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献