CxFy polymer film deposition in DC and RF fluorinert vapor plasmas
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference11 articles.
1. CF2 production and loss mechanisms in fluorocarbon discharges: Fluorine-poor conditions and polymerization
2. Materials Characterization of Plasma Deposited Copolymer Using CFC-113 WithC2H4Monomer
3. 2–10 nm scale plasma polymerized organic films
4. Controlling Fluorine Concentration of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics
5. Decomposition of fluorocarbon gaseous contaminants by surface discharge-induced plasma chemical processing
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