Controlling Fluorine Concentration of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 29 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Electrical Properties of Plasma Deposited Low-Dielectric-Constant Fluorinated Amorphous Carbon Films;Plasma Science and Technology;2006-11
2. Preparation of fluorocarbon thin film deposited by soft X-ray ablation and its electrical characteristics and thermal stability;Applied Surface Science;2006-09
3. Study of fluorinated amorphous carbon films prepared by electron cyclotron resonance chemical vapor deposition;Acta Physica Sinica;2006
4. Investigation of fluorocarbon plasma deposition from c‐C4F8 for use as passivation during deep silicon etching;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2004-11
5. Plasma Copolymerization of C6F6/C5F8for Application of Low-Dielectric-Constant Fluorinated Amorphous Carbon Films and Its Gas-Phase Diagnostics UsingIn SituFourier Transform Infrared Spectroscopy;Japanese Journal of Applied Physics;2004-05-11
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