An atomic layer deposition process for moving flexible substrates
Author:
Publisher
Elsevier BV
Subject
Industrial and Manufacturing Engineering,General Chemical Engineering,Environmental Chemistry,General Chemistry
Reference18 articles.
1. Interlayer Dielectrics for Semiconductor Technologies;Groner,2003
2. Gas diffusion ultrabarriers on polymer substrates using Al2O3 atomic layer deposition and SiN plasma-enhanced chemical vapor deposition
3. Thickness dependence of sensor response for CO gas sensing by tin oxide films grown using atomic layer deposition
4. Atomic layer deposited protective coatings for micro-electromechanical systems
5. Synthesis and Surface Engineering of Complex Nanostructures by Atomic Layer Deposition
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