Reversible absorption of NF3 with high solubility in Lewis acidic ionic liquids

Author:

Ji Jialan,Xiong Wenjie,Zhang Xiaomin,Peng Lingling,Shi Mingzhen,Wu Youting,Hu Xingbang

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,General Chemical Engineering,Environmental Chemistry,General Chemistry

Reference45 articles.

1. Environmental and health risk analysis of nitrogen trifluoride (NF3), a toxic and potent greenhouse gas;Tsai;J. Hazard. Mater.,2008

2. Inhomogeneous radiative forcing of NF3;Lu;Atmosphere,2017

3. Feed gas purity and environmental concerns in plasma etching;Flamm;Solid State Technol.,1993

4. Plasma etching of SiC surface using NF3;Tasaka;J. Vac. Sci. Technol. A,2002

5. Comparison of the etching and plasma characteristics of discharges in CF4 and NF3;Ianno;J. Electrochem. Soc.,1981

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