Development and characterization of ultra high aspect ratio microstructures made by ultra deep X-ray lithography

Author:

Nazmov Vladimir,Reznikova Elena,Mohr Juergen,Schulz Joachim,Voigt Anja

Publisher

Elsevier BV

Subject

Industrial and Manufacturing Engineering,Metals and Alloys,Computer Science Applications,Modelling and Simulation,Ceramics and Composites

Reference49 articles.

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3. Integrated photonics devices on SU8 organic materials;Bêche;Int. J. Phys. Sci,2010

4. Use of SU-8 photoresist for very high aspect ratio X-ray lithography;Bogdanov;Microelectron. Eng.,2000

5. Fabrication of micro-gas chromatograph columns for fast chromatography;Bhushan;Microsyst. Technol.,2007

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