Use of SU-8 photoresist for very high aspect ratio x-ray lithography-Reference-Cited by-同舟云学术

Use of SU-8 photoresist for very high aspect ratio x-ray lithography

Published:2000-06 Issue:1-4 Volume:53 Page:493-496
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Bogdanov A.L.,Peredkov S.S.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. High aspect ratio resist for thick film applications;LaBianca,1995

2. High aspect ratio optical resist chemistry for MEMS applications;LaBianca,1995

3. Micromachining applications for a high resolution ultra-thick photoresist;Lee;J. Vac. Scien. Technol. B,1995

4. Negative photoresists for optical lithography;Shaw;IBM Journal of Research and Development,1997

5. High aspect ratio ultrathick, negative-tone near-UV photoresist for MEMS applications;Despont,1997

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