High efficiency fine boring of monocrystalline silicon ingot by electrical discharge machining

Author:

Unoa Yoshiyuki,Okada Akira,Okamoto Yasuhiro,Yamazaki Kazuo,Risbud Subhash H,Yamada Yoshiaki

Publisher

Elsevier BV

Subject

General Engineering

Reference9 articles.

1. Semiconductor Technology;Shono,1987

2. Plasma Process Technology for Semiconductor;Sugano,1993

3. Dry Etching Technology for Semiconductor;Tokuyama,1992

4. Microstructuring of silicon by electrodischarge machining (EDM);Dominiek;Sensors and Actuators,1997

5. Fundamental study on electrical discharge machining of single crystalline silicon;Uno;J JSPE,1997

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