Ab initio study of the one-monolayer Sb/Si(001) interface
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference25 articles.
1. Site Exchange of Ge and Sb on Si(100) during Surfactant-Mediated Epitaxial Growth
2. Electronic structures of As/Si(001) 2×1 and Sb/Si(001) 2×1 surfaces
3. Ab initiocalculations of Si, As, S, Se, and Cl adsorption on Si(001) surfaces
4. Atomic-step rearrangement on Si(100) by interaction with antimony
5. Adsorption of As on stepped Si(100): Resolution of the sublattice-orientation dilemma
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1. Surface Stresses at the Initial Steps of the GexSi1-x/Si(001) Surface Oxidation;Ukrainian Journal of Physics;2014-02
2. Stress-driven structural transformation of Sb-passivated Si(114);Surface Science;2012-02
3. Simulation of SiH4 adsorption on H/Si(100) surfaces;Thin Solid Films;2006-04
4. Ultra-low-temperature homoepitaxial growth of Sb-doped silicon;Journal of Crystal Growth;2005-12
5. First-principles study of indium on silicon (100)—the structure, defects and interdiffusion;Surface Science;2004-11
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