Oxidation processes on the H2O-chemisorbed Si(100) surface studied by in-situ infrared spectroscopy-Reference-Cited by-同舟云学术

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Oxidation processes on the H2O-chemisorbed Si(100) surface studied by in-situ infrared spectroscopy

Published:1998-04 Issue:3 Volume:401 Page:364-370
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

Niwano Michio,Terashi Miyako,Shinohara Masanori,Shoji Daisei,Miyamoto Nobuo

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference23 articles.

1. Dissociative chemisorption of H2O on Si(100) and Si(111) - a vibrational study

2. Multiple vibrational excitations of H2O and D2O on Si(100)(2 × 1): A HREELS study

3. Dissociative chemisorption of H2O on Si(100) and Si(111) - a vibrational study

4. Chemisorption ofH2O on Si(100)

5. A comparative study of O2, H2 and H2O adsorption on Si(100)

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