IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor-Reference-Cited by-同舟云学术

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IR study of fundamental chemical reactions in atomic layer deposition of HfO2 with tetrakis(ethylmethylamino)hafnium (TEMAH), ozone, and water vapor

Published:2012-07 Issue:19 Volume:258 Page:7726-7731
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Hirose F.,Kinoshita Y.,Kanomata K.,Momiyama K.,Kubota S.,Hirahara K.,Kimura Y.,Niwano M.

Funder

grant-in-aid for Scientific Research(c)

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference26 articles.

1. Atomic layer deposition and characterization of hafnium oxide grown on silicon from tetrakis(diethylamino)hafnium and water vapor

2. ALD and Parasitic Growth Characteristics of the Tetrakisethylmethylamino Hafnium (TEMAH)/H[sub 2]O Process

3. Atomic Layer Deposition of HfO[sub 2], TiO[sub 2], and Hf[sub x]Ti[sub 1−x]O[sub 2] Using Metal (Diethylamino) Precursors and H[sub 2]O

4. Analysis of hydroxyl group controlled atomic layer deposition of hafnium dioxide from hafnium tetrachloride and water

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1. Room temperature atomic layer deposition of zinc titanium oxide using sequential adsorption of dimethyl zinc and tetrakis(dimethylamino)titanium;Japanese Journal of Applied Physics;2024-04-01

2. Effect of residual impurities on the behavior and laser-induced damage of oxide coatings exposed to deep space radiation;Optical Materials;2023-06

3. CBVD grown HfO2 on TiN for high-precision MIM capacitor;Physica B: Condensed Matter;2023-02

4. Kinetic study on initial surface reaction of titanium dioxide growth using tetrakis(dimethylamino)titanium and water in atomic layer deposition process: Density functional theory calculation;Chemical Physics;2022-10

5. Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon;Journal of Vacuum Science & Technology A;2022-03

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