Interactions between binary metallic alloys and Si, GeSi and GaAs
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference175 articles.
1. Thin Film Interdiffusion and Reactions;Tu,1978
2. VLSI Electronics Microstructure Science, Vol. 16;Nicolet,1983
3. Silicide formation with Pd‐V alloys and bilayers
4. Shallow silicide contact
5. Amorphous Metallizations for High-Temperature Semiconductor Device Applications
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2. Electrical and low frequency noise properties of Gd and GdCo silicide contacts on n-type Si;Semiconductor Science and Technology;2000-06-23
3. Spectromicroscopy study of an Ni+Ag/Si(111) interface;Surface and Interface Analysis;2000
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5. Oxidation behavior of cobalt silicide and cobalt germanide thin films;Applied Surface Science;1997-11
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