Quaternary ammonium-based levelers for high-speed microvia filling via Cu electrodeposition
Author:
Publisher
Elsevier BV
Subject
Electrochemistry,General Chemical Engineering
Reference71 articles.
1. Damascene copper electroplating for chip interconnections;Andricacos;IBM J. Res. Dev.,1998
2. Superconformal electrodeposition of copper in 500–90nm features;Moffat;J. Electrochem. Soc.,2000
3. Filling mechanism in microvia metallization by copper electroplating;Dow;Electrochim. Acta,2008
4. Effect of convection-dependent adsorption of additives on microvia filling in an acidic copper plating solution;Huang;J. Electrochem. Soc.,2012
5. Electrochemical behaviors of Janus Green B in through-hole copper electroplating: an insight by experiment and density functional theory calculation using Safranine T as a comparison;Wang;Electrochim. Acta,2013
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