Fundamentals of Electron and X-Ray Lithography-Reference-Cited by-同舟云学术

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Fundamentals of Electron and X-Ray Lithography

Published:1980 Issue: Volume: Page:1-104
ISSN:0167-790X
Container-title:Fine Line Lithography
language:
Short-container-title:

Author:

WITTELS N.D.

Publisher

Elsevier

Reference217 articles.

1. Lanthanum Hexaboride Electron Emitter

2. Monte Carlo Simulation of Alignment Mark Signal for Direct Electron-Beam Writing

3. Control system design and alignment methods for electron lithography

4. Design of fast deflection coils for an electron‐beam microfabrication system

5. Back Scattering of Electrons

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Concluding remarks;Ion Tracks and Microtechnology;1990

2. Growth areas;Ion Tracks and Microtechnology;1990

3. Properties of Polymer Resists;Examining the Submicron World;1986

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