Author:
Alles D. S.,Ashley F. R.,Johnson A. M.,Townsend R. L.
Cited by
21 articles.
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1. Proposed architecture of a multicolumn electron-beam wafer inspection system for high-volume manufacturing;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2015-11
2. An electron-beam inspection system for x-ray mask production;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1991-11
3. A SEM-image processing method for recognition and fast location of IC registration marks;Microelectronic Engineering;1990-04
4. A method for hybrid lithography;Microelectronic Engineering;1988-08
5. Distortion correction and overlay accuracies achieved by the registration method using two-stage standard mark system;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1986-05