Efficacy of low etch rate in achieving nanometer-scale smoothness of Si (100) and (110) plane surfaces using KOH and KOH/IPA solutions for optical mold applications-Reference-Cited by-同舟云学术

Efficacy of low etch rate in achieving nanometer-scale smoothness of Si (100) and (110) plane surfaces using KOH and KOH/IPA solutions for optical mold applications

Published:2014-03 Issue: Volume:209 Page:124-132
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

An Shinmo,Lee Seung Gol,Park Se-Guen,Lee El-Hang,O Beom-Hoan

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference17 articles.

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