Thermo-mechanical properties of alumina films created using the atomic layer deposition technique-Reference-Cited by-同舟云学术

Thermo-mechanical properties of alumina films created using the atomic layer deposition technique

Published:2010-11 Issue:1-2 Volume:164 Page:58-67
ISSN:0924-4247
Container-title:Sensors and Actuators A: Physical
language:en
Short-container-title:Sensors and Actuators A: Physical

Author:

Miller David C.,Foster Ross R.,Jen Shih-Hui,Bertrand Jacob A.,Cunningham Shawn J.,Morris Arthur S.,Lee Yung-Cheng,George Steven M.,Dunn Martin L.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Metals and Alloys,Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation,Electronic, Optical and Magnetic Materials

Reference99 articles.

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4. Viscous flow reactor with quartz crystal microbalance for thin film growth by atomic layer deposition;Elam;Rev. Sci. Instrum.,2002

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