New avenues for residual stress analysis in ultrathin atomic layer deposited free-standing membranes through release of micro-cantilevers-Reference-Cited by-同舟云学术

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New avenues for residual stress analysis in ultrathin atomic layer deposited free-standing membranes through release of micro-cantilevers

Published:2024-02 Issue:4 Volume:10 Page:e26420
ISSN:2405-8440
Container-title:Heliyon
language:en
Short-container-title:Heliyon

Author:

Burgmann S.^ORCID,Lid M.J.,Johnsen H.J.D.^ORCID,Vedvik N.P.,Haugen B.^ORCID,Provine J.^ORCID,van Helvoort A.T.J.,Torgersen J.

Funder

Research Council of Norway

Publisher

Elsevier BV

Reference41 articles.

1. Intrinsic strain modeling and residual stress analysis for thin-film processing of layered structures;Ghasemi Nejhad;J. Electron. Packag.,2003

2. Post-release deformation and curvature correction of an electrothermally actuated MEMS bilayer platform;Kumar;Microelectron. Eng.,2020

3. Large-area and ultrathin MEMS mirror using silicon micro rim;Ahn;Micromachines,2021

4. Ald-metal uncooled bolometer;Yoneoka,2011

5. Strengthening ultrathin Si3N4 membranes by compressive surface stress;Shafikov;Sens. Actuators A, Phys.,2021

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