Thermal decomposition of NH3 on the Si(100) surface
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Reference38 articles.
1. Scaling the gate dielectric: Materials, integration, and reliability
2. Ultrathin (<4 nm) SiO2 and Si–O–N gate dielectric layers for silicon microelectronics: Understanding the processing, structure, and physical and electrical limits
3. The adsorption and decomposition of NH3 ON Si(100)—detection of the NH2(a) species
4. Decomposition of NH3 on Si(100): a SSIMS study
5. Theoretical investigation of the initial steps of the adsorption of N atoms on Si(100)-2×1
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1. Reaction of Hydrazine with Solution- and Vacuum-Prepared Selectively Terminated Si(100) Surfaces: Pathways to the Formation of Direct Si–N Bonds;Langmuir;2020-10-21
2. The role of active species in the N 2 and N 2 -H 2 RF afterglows on selective surface nitriding of ALD-grown TiO 2 films;Surface and Coatings Technology;2017-09
3. A nitride-based epitaxial surface layer formed by ammonia treatment of silicene-terminated ZrB2;The Journal of Chemical Physics;2016-04-07
4. Nitrogen Adsorption of Si(100) Surface by Plasma Excited Ammonia;IEICE Transactions on Electronics;2015
5. Ammonia Photodissociation Promoted by Si(100);The Journal of Physical Chemistry A;2014-05-20
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