Microcrystalline silicon with high electron field-effect mobility deposited at 230°C
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. Complete microcrystallinep‐i‐nsolar cell—Crystalline or amorphous cell behavior?
2. A Low Temperature Plasma-Assisted Deposition Process for Microcrystalline Thin Film Transistors, TFTS
3. In-SituChemically Cleaning Poly-Si Growth at Low Temperature
4. Polycrystalline silicon thin film transistors deposited at low substrate temperature by remote plasma chemical vapor deposition using SiF4/H2
5. Transistors With a Profiled Active Layer Made by Hot-Wire CVD
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