Application of vapor phase decomposition/total reflection X-ray fluorescence in the silicon semiconductor manufacturing environment
Author:
Publisher
Elsevier BV
Subject
Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry
Reference14 articles.
1. G.B. Other, Personal Communications with Micron Technology, Inc., Design Engineers, 1998.
2. Surface metal contamination during ion implantation: comparison of measurements by SIMS, TXRF and VPD used in conjunction with GFAA and ICPMS;Frost;J. Vac. Sci. Technol. B,1996
3. Evaluation of surface analysis methods for characterization of trace metal surface contaminants found in silicon integrated circuit manufacturing;Diebold;J. Vac. Sci. Technol. A,1992
4. Comparison of wafer cleaning processes using TXRF;Hockett;J. Electrochem. Soc.,1989
5. Characterization and application of VPD technique for trace metal analysis on silicon oxide surfaces;Hall;Surf. Interface Anal.,1996
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