Evaluation of surface analysis methods for characterization of trace metal surface contaminants found in silicon integrated circuit manufacturing-Reference-Cited by-同舟云学术

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Evaluation of surface analysis methods for characterization of trace metal surface contaminants found in silicon integrated circuit manufacturing

Published:1992-07 Issue:4 Volume:10 Page:2945-2952
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Diebold Alain C.,Maillot P.,Gordon M.,Baylis J.,Chacon J.,Witowski R.,Arlinghaus H. F.,Knapp J. A.,Doyle B. L.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577734

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3. Semiconductors, Elemental-Material Properties;digital Encyclopedia of Applied Physics;2003-04-15

4. Surface and Thin-Film Analysis;Ullmann's Encyclopedia of Industrial Chemistry;2002-01-15

5. An Electronics Division Retrospective (1952-2002) and Future Opportunities in the Twenty-First Century;Journal of The Electrochemical Society;2002

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