Total-reflection X-ray fluorescence analysis for semiconductor process characterization
Author:
Publisher
Elsevier BV
Subject
Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry
Reference22 articles.
1. International Technology Roadmap for Semiconductors, http://public.itrs.net/
2. Novel methods of TXRF analysis for silicon wafer surface inspection
3. Determination of ultra trace contaminants on silicon wafer surfaces using total-reflection X-ray fluorescence TXRF ‘state-of-the-art’
4. A Standard Sample Preparation Method for the Determination of Metal Impurities on a Silicon Wafer by Total Reflection X-Ray Fluorescence Spectrometry.
5. Error factors in quantitative total reflection x-ray fluorescence analysis
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1. Investigation of the Two-Way Injection Slurry-Supply Method for the Cu CMP Process;Applied Sciences;2023-03-15
2. Vapor phase treatment–total reflection X-ray fluorescence for trace elemental analysis of silicon wafer surface;Spectrochimica Acta Part B: Atomic Spectroscopy;2013-12
3. Trends in total reflection X-ray fluorescence spectrometry for metallic contamination control in semiconductor nanotechnology;Spectrochimica Acta Part B: Atomic Spectroscopy;2006-05
4. Atomic spectrometry update. Industrial analysis: metals, chemicals and advanced materials;Journal of Analytical Atomic Spectrometry;2004
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