Determination of ultra trace contaminants on silicon wafer surfaces using total-reflection X-ray fluorescence TXRF ‘state-of-the-art’
Author:
Publisher
Elsevier BV
Subject
Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry
Reference69 articles.
1. Diagnostic and monitoring tools of large scale Si-manufacturing: Trace-analytical tools and techniques in Si-wafer manufacturing;Fabry;IEEE Trans. Semicond. Manuf.,1996
2. TXRF with synchrotron radiation. Analysis for Ni on Si-wafer surfaces;Wobrauschek;Nucl. Instr. Meth. A,1995
3. Measurement of trace metallic contaminants on silicon wafer surfaces in native and dielectric silicon oxides by vapor phase decomposition flow injection inductively coupled plasma-mass spectrometry;Fucsko;J. Electrochem. Soc.,1993
4. Trace analysis of microcontaminations in compliance with ISO 9001: monitoring and diagnostics in large-scale silicon manufacturing Accred;Fabry;Qual. Assur.,1996
5. A natural history of analytical methods;Thompson;Analyst,1999
Cited by 65 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Suitability and Applications of Total-Reflection X-Ray Fluorescence Spectrometry for Analytical Characterization of Nuclear Materials;Critical Reviews in Analytical Chemistry;2024-02-26
2. Total Reflection X-ray Fluorescence: Suitability and Applications for Material Characterization;Handbook of Materials Science, Volume 1;2023-11-22
3. Impact of Depth-Wise Inhomogeneous Iron Distributions on the Accuracy of Lifetime-Based Interstitial Iron Measurements on Silicon Wafers;IEEE Journal of Photovoltaics;2023-07
4. Review on the elemental analysis of polymetallic deposits by total-reflection X-ray fluorescence spectrometry;Applied Spectroscopy Reviews;2022-10-13
5. Imaging of Metal Ions and Nanoparticles on Structured Silicon Surface Using Laser Ablation-Inductively Coupled Plasma-Mass Spectrometer for Contamination Control in Semiconductor Manufacturing Process;IEEE Transactions on Semiconductor Manufacturing;2021-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3