A Standard Sample Preparation Method for the Determination of Metal Impurities on a Silicon Wafer by Total Reflection X-Ray Fluorescence Spectrometry.
Author:
Affiliation:
1. Electronics Research Laboratories, Nippon Steel Corporation, c/o NSC Electron Corporation
2. Advanced Materials and Technology Research Laboratories, Nippon Steel Corporation
Publisher
Springer Science and Business Media LLC
Subject
Analytical Chemistry
Link
http://www.jstage.jst.go.jp/article/analsci1985/11/3/11_3_499/_pdf
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