Plasma immersion ion implantation for metallurgical and semiconductor research and development
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference31 articles.
1. IEEE Int. Conf. on Plasma Science;Conrad,1986
2. Sheath thickness and potential profiles of ion‐matrix sheaths for cylindrical and spherical electrodes
3. Plasma source ion‐implantation technique for surface modification of materials
4. Plasma immersion ion implantation using plasmas generated by radio frequency techniques
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