Structural and optical properties of a-C:H:O:Cl and a-C:H:Si:O:Cl films obtained by Plasma Enhanced Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Structural and optical properties of a-C:H:O:Cl and a-C:H:Si:O:Cl films obtained by Plasma Enhanced Chemical Vapor Deposition

Published:2018-08 Issue: Volume:214 Page:277-284
ISSN:0254-0584
Container-title:Materials Chemistry and Physics
language:en
Short-container-title:Materials Chemistry and Physics

Author:

Fernandes Isabela Cristina,Hadich Tayan Vieira,Amorim Milena Kowalczuk Manosso,Turri Rafael Gustavo,Rangel Elidiane C.,Dias da Silva José Humberto,Durrant Steven F.

Funder

FAPESP

ICF

TVH

CNPq (PIBIC)

UNESP

CAPES

Publisher

Elsevier BV

Subject

Condensed Matter Physics,General Materials Science

Reference15 articles.

1. Structural and optical properties of chlorinated plasma polymers;Turri;Thin Solid Films,2011

2. Characterization of amorphous hydrogenated chlorinated plasma polymers;Rossi;Surf. Coating. Technol.,2016

3. Effects of aging on chlorinated plasma polymers;Turri;Mater. Res.,2017

4. Characterization of PECVD a-C: H:Si:O: Cl films;Rossi;J. Vac. Sci. Technol., A,2017

5. Chlorine dopants in plasma synthesized heteroaromatic polymers;Vásquez;Polymer,2006

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1. Visual UV-sensitive colorimetric film deposited by PECVD;Materials Chemistry and Physics;2024-09

2. The role of plasma technology in barrier coating deposition;Reviews of Modern Plasma Physics;2022-09-07

3. Organosilicon films deposited in low-pressure plasma from hexamethyldisiloxane — A review;Vacuum;2021-12

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