Theoretical study of water-induced oxidation reaction on a bare Si surface: H2O+Si(100)–(2×1)
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference20 articles.
1. InitialH2O-induced Oxidation of Si(100)–(2×1)
2. Silicon Epoxide: Unexpected Intermediate during Silicon Oxide Formation
3. Si–H bending modes as a probe of local chemical structure: Thermal and chemical routes to decomposition of H2O on Si(100)-(2×1)
4. First-Principles Study of Oxide Growth on Si(100) Surfaces and atSiO2/Si(100) Interfaces
5. Kinetics of Initial Layer-by-Layer Oxidation of Si(001) Surfaces
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1. An Unexpected Role of H During SiC Corrosion in Water;The Journal of Physical Chemistry C;2020-04-02
2. Regeneration of Cu/SAPO-34(MO) with H2O only: too good to be true?;Catalysis Science & Technology;2020
3. Oxidation of Liquid Silicon in Air Atmospheres Containing Water Vapor;Industrial & Engineering Chemistry Research;2019-03-25
4. Toward Atomic-Scale Patterned Atomic Layer Deposition: Reactions of Al2O3 Precursors on a Si(001) Surface with Mixed Functionalizations;The Journal of Physical Chemistry C;2016-02-01
5. Initial oxidation structure of chlorinated Si(001);Journal of the Korean Physical Society;2012-02
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