Analytical model of gate leakage current through bilayer oxide stack in advanced MOSFET

Author:

Basak Rathin,Maiti Biswajit,Mallik Abhijit

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science

Reference28 articles.

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3. C. Lee, H.J. Cho, C.S. Kang, S. Rhee, Y.H. Kim, R. Choi, C.Y. Kang, C. Choi, M. Abkar, High-k dielectrics and MOSFET characteristics, in: IEDM Tech. Dig., 2003, pp. 4.4.1–4.4.4.

4. Ultrathin device quality oxide-nitride-oxide heterostructure formed by remote plasma enhanced chemical vapor deposition;Ma;Appl. Phys. Lett.,1994

5. Advantages of thermal nitride and nitroxide gate films in VLSI process;Ito;IEEE Trans. Electron Devices,1982

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