Characterization and simulation on antireflective coating of amorphous silicon oxide thin films with gradient refractive index-Reference-Cited by-同舟云学术

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Characterization and simulation on antireflective coating of amorphous silicon oxide thin films with gradient refractive index

Published:2016-08 Issue: Volume:96 Page:198-204
ISSN:0749-6036
Container-title:Superlattices and Microstructures
language:en
Short-container-title:Superlattices and Microstructures

Author:

Huang Lu,Jin Qi,Qu Xingling,Jin Jing,Jiang Chaochao,Yang Weiguang,Wang Linjun,Shi Weimin

Funder

National Science Foundation of China

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science

Reference21 articles.

1. Hot wire chemical vapor deposition of Si containing materials for solar cells

2. Polycrystalline silicon thin-film transistors: A continuous evolving technology

3. Polycrystalline silicon thin film transistors

4. Excellent surface passivation of heavily doped p+ silicon by low-temperature plasma-deposited SiOx/SiNy dielectric stacks with optimised antireflective performance for solar cell application

5. Si-rich SiNx rear passivated c-Si solar cell with a novel antimony Local Back Surface Field formed by Laser Fired Contact

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1. Preparation and photothermal properties of composite materials of gradient index glass and disordered mesoporous carbon;Journal of Materials Science: Materials in Electronics;2021-10-10

2. Effects of various substrate materials on microstructural and optical properties of amorphous silicon oxynitride thin films deposited by plasma-enhanced chemical vapor deposition;Thin Solid Films;2020-09

3. Research Progress in Preparation of Optical Thin Films by PECVD;Laser & Optoelectronics Progress;2020

4. Characterization of Hydrophobic Silane Film Deposited on AISI 304 Stainless Steel for Corrosion Protection;Journal of Materials Engineering and Performance;2019-09-26

5. Surface modification of silicon oxycarbide films produced by remote hydrogen microwave plasma chemical vapour deposition from tetramethyldisiloxane precursor;Surface and Coatings Technology;2018-09

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