Effects of various substrate materials on microstructural and optical properties of amorphous silicon oxynitride thin films deposited by plasma-enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

Effects of various substrate materials on microstructural and optical properties of amorphous silicon oxynitride thin films deposited by plasma-enhanced chemical vapor deposition

Published:2020-09 Issue: Volume:709 Page:138186
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Hang Liangyi^ORCID,Liu Weiguo,Xu Junqi,Yang Chen,Zhou Shun

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference50 articles.

1. Low-temperature deposition of high-quality silicon oxynitride films for CMOS-integrated optics;Rangarajan;Opt. Lett.,2013

2. Plasma-enhanced chemical vapor deposition of silicon dioxide deposited at low temperatures;Ceiler;J. Electrochem. Soc.,1995

3. Optical and structural characterization of silicon nitride thin films deposited by PECVD;Guler;Mater. Sci. Eng. B.,2019

4. Effect of rapid thermal annealing on the properties of PECVD SiNx thin films;Karunagaran;Mater. Chem. Phys,2007

5. Film materials based on a-SiNx:h with high refractive index obtained by plasma enhanced chemical vapor deposition technology;Jaglarz;Thin Solid Films,2019

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Tailoring Mechanical and Optical Properties of Sputtered SiN_x/BN Coatings;ACS Applied Materials & Interfaces;2024-09-12

2. Interface and Size Effects of Amorphous Si/Amorphous Silicon Oxynitride Multilayer Structures on the Photoluminescence Spectrum;Coatings;2024-08-02

3. Computational thermodynamic study on CVD of silicon oxynitride films from Si–O–N–H and Si–O–N–H–Cl systems;Ceramics International;2024-04

4. Recent Advances in the Plasma-Assisted Synthesis of Silicon-Based Thin Films and Nanostructures;Coatings;2023-06-10

5. Design and preparation of high-transmittance broadband antireflection coatings with tailored refractive indices deposited by PECVD;Vacuum;2023-02