Author:
Froeschle B,Sacher N,Glowacki F,Theiler T
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference11 articles.
1. Cleaning and contamination monitoring systems for the semiconductor industry. San Jose, CA: VLSI Research, April 1986
2. Khilnami A. Cleaning semiconductor surfaces: facts and foibles. In: Mittal KL, editor. Particles on surfaces 1. Detection, adhesion and removal. New York: Plenum Press, 1986. p. 17
3. Effects of chemical composition on the electrical properties of NO‐nitrided SiO2
4. General Relationship for the Thermal Oxidation of Silicon
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1 articles.
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