Real-time monitoring of the desorption process of chlorine-covered Si(111)-‘1×1’ surface with second-harmonic generation
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Condensed Matter Physics,General Chemistry
Reference36 articles.
1. Cl2 chemical dry etching of GaAs under high vacuum conditions—Crystallographic etching and its mechanism
2. GaAs Surface Cleaning/Etching Using Plasma-Dissociated Cl Radical
3. Silicon Molecular Layer Epitaxy
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5. Optical response of Si(111)-7 × 7
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2. Nanometer-Scale Structure Formation on Solid Surfaces;Nano- and Micromaterials;2008
3. Regular arrangement of nanometre-scale clusters by surface strain on stabilized Cl/Si(111);Journal of Physics: Condensed Matter;2007-02-13
4. Surface modification of Cl-adsorbed Si(111)-7×7 by the irradiation of infrared pulsed laser;Surface Science;2004-09
5. Reactivity of halogens on a Si(111) surface studied by surface differential reflectivity;Physical Review B;2003-10-20
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