Numerical and experimental analysis on green laser crystallization of amorphous silicon thin films-Reference-Cited by-同舟云学术

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Numerical and experimental analysis on green laser crystallization of amorphous silicon thin films

Published:2009-06 Issue:4 Volume:41 Page:380-383
ISSN:0030-3992
Container-title:Optics & Laser Technology
language:en
Short-container-title:Optics & Laser Technology

Author:

Yuan Zhijun,Lou Qihong,Zhou Jun,Dong Jingxing,Wei Yunrong,Wang Zhijiang,Zhao Hongming,Wu Guohua

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference15 articles.

1. Polycrystalline silicon thin film transistors;Brotherton;Semicond Sci Technol,1995

2. Thin-film silicon solar cell technology;Shah;Prog Photovoltaics: Res Appl Technol,2004

3. Low-pressure chemical vapor deposition of nanograin polysilicon ultra-thin films;Ecoffey;Nanotechnology,2002

4. A new era of crystallization: advances in polysilicon crystallization and crystal engineering;Voutsas;Appl Surf Sci,2003

5. High-performance polycrystalline silicon thin film transistors on non-alkali glass produced using continuous wave laser lateral crystallization;Akito;Jpn J Appl Phys,2002

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