Determination of the hydrogen concentration of silicon nitride layers by Fourier transform infrared spectroscopy
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference5 articles.
1. Dielectric Materials in Semiconductor Devices
2. Microelectronic Materials;Grovenor,1989
3. Silicon nitride thin-film deposition by LPCVD with in situ HF vapor cleaning and its application to stacked DRAM capacitor fabrication
4. W.R. Knolle, Report AT&T Bell Laboratories, Reading, PA 19607, unpublished.
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